ECVPro+ introduces the first ever in-situ camera for unprecedented levels of control, ECVision™. allowing real-time imaging of the semiconductor/ electrolyte interface. Now you can see exactly what occurs at the sample surface during a measurement. For III-Nitrides, the ECVPro+ UV option extends the performance of the system for optimal profiling of GaN, InGaN and AlGaN.

Hg Probe Alternative: The ECVPro+’s accuracy and reproducibility provide a viable, safe and environmentally friendly alternative to the Mercury probe. ECVPro+ uses no Calomel reference electrode and is entirely Mercury free. The horizontal stage makes monitoring spatial distribution across a wafer simple and convenient. Using the depletion profile mode and the ultra-repeatable contacting area, ECVPro+ can accurately measure the surface doping variations across a wafer.

Alternative to Hall: ECVPro+ offers many advantages over Hall measurements. These include measurement of electrically activated dopants and individual structural layer information. Additionally, the ECVPro+ can be applied to a wide range of materials and structures and is not limited to profiling only on Si or suitable PN structures.

Eliminate Operator Variability. Operator training time is reduced. Sample preparation is simplified and the intuitive software leads the operator through the measurement process step by step reducing the possibility of errors. Recipe-driven operation means no operator involvement when profiling complex structures.

The novel design extends the sealing ring lifetime and eliminates the cost of expensive Calomel electrodes. Signal electrodes and contact sets need less frequent replacement.

The floor standing designs reduces footprint by approximately a factor of two compared with other profilers. As the electrolyte and waste are contained on the unit, there is no need for an adjacent wet-bench.