Capacitance Voltage Mapping

Automated Mercury Probe Systems

Designed for superior repeatability, accuracy, and safety, the CV Mapping system uses Four Dimensions’ patented inverse mercury probe technology to measure capacitance voltage directly on non-patterned wafers without damaging samples. The unique Mercury Refresh feature improves performance by ensuring clean contact, with no mercury left on samples after testing. The spill-proof reservoir requires replacement only twice a year. Built on a Windows 7 interface, the system is user-friendly and versatile for both R&D and production applications.
• Refreshed mercury before each contact ensures clean contact
• Easy-to-change probe head
• Minimal probe head to wafer contact area
• Non scratching poly-carbonate probe head material

Applications

  • Thickness and k value for high/low k films
  • Carrier density profiling
  • Epi layer mapping
  • Low dose ion implant layers
  • Oxide integrity (Vbd, Qbd)
  • Furnace contamination monitor
  • SOI wafer characterization
  • USJ layer carrier density profiling

Specifications

Measurement Range

  • Capacitance Measurement Range: 0 to 20,000 pF through internal meter, or limited by the specification of the external meter
  • Current Measurement Range: 50fA to 1 mA
  • Bias Available: -100 to 100 V internal, or specified by the external meter up to 1000V
  • Measurement Pulse: 50mV, 100mV, >20µ for Ch, >1ms for Cq
  • Wafer Size: From 1 cm x 1 cm square chip to 8″ or 12″ round wafer
  • Probe: Mercury dot from 2×10⁻⁵ cm² to 0.8 cm², without mercury ring, or with 1-2 mercury rings or external probe station

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