Bring Us Your Toughest Wet Process Challenge

For more than 30 years, Toho has engineered clean, etch, strip, and develop systems for problems standard equipment can’t solve: sub-micron particles on G10 display panels, photomasks, glass panels for AI chip packaging, space-grade cover glass, and production automotive parts. Built in Japan, installed by veteran Toho engineers from Japan, and supported by local U.S. technicians.

350+ Precision wet tools installed
Up to G10 Substrate size
85%+ Share of FPD cassette and parts cleaning
Since 1829 Toho Group, family-owned

Markets

Built for the Glass Behind AI, Space, and Displays

Glass is moving to the center of advanced semiconductors, and every new application raises the bar on cleanliness. Toho engineers each system around the substrate, the contamination, and the step that follows.

Finger touching a glass display panel

Display and touch panel glass

Glass curtain wall on a modern building

Architectural and dynamic glass

Solar array in orbit above Earth

Space solar arrays

Technician cutting a large glass sheet

Industrial glass and finishing

AI and HPC

Advanced Packaging Glass

Glass core substrates and interposers are moving to large panels such as 510 × 515 mm. Toho cleans between through-glass via, etch, and metallization steps, on panel formats it has handled for decades.

Lithography

Semiconductor and Photomask

Double sided spin cleaners for lithographic masks up to 1600 × 1800 mm, with quartz masks and reticle blanks engineered to your particle spec.

Cover and optical glass

Space and Aerospace

Cover glass and optical glass cleaning before bonding and coating, where a single particle can cost a solar cell in orbit.

Digital X-ray

Medical and Imaging Sensors

Toho wet scrubbers clean the glass for digital X-ray imaging sensors developed by leading medical imaging companies in North America.

FPD

Display and Cleanroom

Incoming, pre-lithography, pre-deposition, pre-etch, and post-scribe cleaning for leading panel makers, plus compact cleaners for smartphone and cover glass.

Smart glass

Architectural and Dynamic Glass

Removal of packaging film, grease, and shards, pre- and post-process cleaning, and clean, polish, and clean combination machines.

Production parts

Industrial and Automotive Parts

Custom glass and parts washers for automotive suppliers. Heavy duty brushes, polishing, and high pressure Mach-Jet™ remove grease, marker, tape residue, and separator beads.

Labs and qualification

R&D and Pilot Lines

Stand-alone, spin, and compact double decker cleaners, so the process you prove in the lab is the one you scale.

Don’t see your application? If it has to come out of a wet process clean and no one else will take it on, bring it to us. Unusual problems are where Toho does its best work.

Describe Your Challenge

Why now

Glass Is Moving to the Center of Advanced Chips

AI accelerators are outgrowing organic substrates. Chipmakers and substrate suppliers are building glass core and interposer pilot lines now, and every through-glass via, etch, and metallization step needs a clean, defect-free surface.

Process equipment is bought first, during the pilot line years. Toho brings decades of large-panel glass cleaning to that window.

$1.3B

Glass core substrates, 2026

$14.2B

Glass core substrates, 2036 forecast

$150M to $341M

Glass interposers, 2026 to 2033

$2.9B to $5.6B

Photomask equipment, 2025 to 2033

Sources: Meticulous Research (glass core substrates, including interposers), Persistence Market Research (glass interposers), Grand View Research (photomask equipment). Analyst forecasts vary widely.

Processes

Seven Processes Across the Glass Line

Listed in process order. The first five run on the substrate line. The last two keep photomasks, cassettes, and chamber parts free of cross contamination.

Incoming and pre-process

Substrate Cleaning

In-line and spin cleaners for incoming glass and every pre-process step. Interchangeable brush, Mach-Jet™, ultrasonic, and megasonic modules remove particles down to sub-micron sizes, with UV excimer modules for organic residue. Mach-Jet™ mixes DI water at 0.5 MPa with air at 0.4 MPa; the bubbles burst on impact and lift small particles without scratching.

Installed Toho glass wet process system in a cleanroom

Key Specs

Substrates Up to G10, 0.5 to 6 mm
Particle removal 95% of particles 2 µm and larger
Water temperature Up to 60 °C (140 °F)

Applications

  • Incoming glass and packaging panel clean

  • Pre-lithography and pre-deposition clean

  • Pre-etch clean

  • Cover glass clean

  • Digital X-ray imaging sensor glass

Configuration

A Typical In-Line Process Flow

Every system is assembled from the same modules. The process stage changes with the application; loading, rinse, dry, and unload stay consistent across the line.

Toho in-line precision cleaning line: load, convey with ID read, UV excimer and roll brush process, cascade and Mach-Jet rinse, CDA or N2 air knife dry, and ionized unload, with fresh DIW cascading from the final rinse back to the first

Precision cleaning line, simplified. Modules change with the application.

01

Load

Robot, manual, indexed elevator, or loader conveyor, with cassette and panel ID read and recorded against the recipe.

02

Convey

Roller conveyance with lateral guides and automatic width adjustment. A buffer stage prevents cross contamination ahead of chemistry.

03

Process

UV excimer organic removal, chemical or chemical-free cleaning, brush, etch, strip, or develop modules, selected per application.

04

Rinse

Cascade rinse with a separate final cascade supply, Mach-Jet™ two-fluid spray for sub-micron particles, and a final DIW rinse.

05

Dry

High pressure CDA or N2 air knife, with integrated blower and HEPA filtered airflow.

06

Unload

Ionizer bars suppress ESD at unload. Substrates exit dry and ready for the next process step.

Performance

Measured Cleaning Results

Dual sided roll and disc brushes, Mach-Jet™, ultrasonic, and megasonic modules can be combined to match the contamination profile of each step.

Particles 2 µm and larger 95% removed
Particles above 5 µm None added
Particles 3 to 5 µm Increase of 2 or fewer
Particles 1 to 3 µm Increase of 10 or fewer

Sample data from a prior application: 500 x 500 mm, 0.5 mm thick glass, class 10 clean room, pre-deposition thin film clean.

Etch chemistries

Proven Etchants by Material

ITO Iron chloride or oxalic acid
Aluminum HNO3 / CH3COOH / H3PO4, or BHF
Chromium Cerium nitrate
SiO2 HNO3 / CH3COOH / H3PO4
Copper HNO3 / CH3COOH / H3PO4, or H2O2 + H3PO4
Titanium F (1%) with additional agents

Build and control

Options, Construction, and Process Monitoring

Optional Modules

  • Hyper Pressure Mach Jet (HPMJ) shower

  • Nearly contact-free conveyance

  • CO2 insertion for ESD suppression

  • Etchant concentration monitor

  • Bacteria prevention for DIW lines

  • CIM / host PC interface

Quality Build

  • Modular PP construction with double glass covers

  • Fully enclosed chambers under positive pressure

  • Interlocks, leak, exhaust, and over-heat sensors

  • Labeled piping and wiring throughout

  • N2 purge against bacteria build-up

Process Monitoring

  • Panel and cassette ID linked to recipes

  • TACT time per process module

  • Speed, pressure, and concentration per wet module

  • Chemical mix, dispense, and recycle

  • Resistivity, pH, and temperature monitoring

  • Data and error logging

Formats

Sized to Your Throughput and Footprint

Each system goes through a full pre-assembly spec review, so engineering and material changes are settled before the build starts.

Toho in-line roller conveyor cleaning system in a cleanroom

In-Line Production

Automated roller conveyor lines engineered around fab throughput and facility requirements, with multiple glass sizes on one tool as an option.

Photo Mask Cleaning

Spin Process

Spin wash, rinse, and dry in place of an in-line system, for photomasks, cassettes, and applications that need a closed chamber.

Toho wet process system for small glass substrates

Small Glass, R&D, and Low Throughput

Compact in-line cleaners for small glass pieces such as smartphone displays and cover glass, plus stand-alone manual load systems and the limited footprint "double decker" cleaner for pilot lines and labs.

1829

Toho Group · Nagoya, Japan

Engineered and built by Toho

One Partner From Design to Your Fab Floor

Toho Group has been family-owned since 1829. Engineers in Japan design each wet process system around your process. Veteran engineers from Japan lead every installation on your floor, backed by local U.S. technicians for start-up, training, and service.

  • Full pre-assembly spec review before the build starts

  • Japanese quality standards, high grade materials, low cost of ownership

  • The same engineering and assembly team builds complex systems for leading metrology and semiconductor equipment companies

  • Measure what you clean: FLX stress, NanoSpec film thickness, and large area profiler lines acquired from KLA-Tencor, Nanometrics, and Zygo

Support and compliance

Installed by Veteran Engineers From Japan, Supported Locally

Veteran Toho engineers from Japan lead every installation and stay on site through start-up, working alongside local U.S. technicians. Training happens at both source and site acceptance, and U.S.-based service, bilingual assistance, and optional remote access keep the line running.

  • Preventative maintenance and repair training

  • PLC programming support

  • NFPA codes and regulations, NEC, OSHA

  • CE compliance as needed

  • SEMI S2

Bring Us Your Cleaning Challenge

Glass, quartz, metal, or a part no one else will take on. Share the material, size, contamination, and throughput. Photos and drawings help most, and a Toho engineer will propose a configuration and footprint.

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