Typical Applications include:

• Measures epitaxial thickness by non-destructive FT-IR technique with very high wafer throughput
• Determines epitaxial thickness on bulk, on patterned wafers, on top of the buried layers, SiGe, polysilicon and multi layers
• FILM Z: Unique algorithms deliver instant qualification of SOI, SiC, and other epitaxial films.
• Built-in intelligence extends the applicability to almost every film material imaginable.
• Qualify thickness of recycled test wafers for rapid payback

• Industry standard robotic wafer handler with built-in pre-aligner
• Optical units with proven Nanometrics FTIR technology
• Complies with SEMI S2-93A and S8-95 standards and conforms with the European Union CE-mark regulations
• Stratus is fully SECS/GEM compliant; SECS interface supports local control operation as well as remote control operation by the Host via
• HSMS/SECS-1 protocols
• Optional 3 or 4 signal lights
• User-friendly GUI with client server architecture
• Unlimited measurement pattern and 2D/3D mapping