Typical applications are peak and dominant wavelength, FWHM, PL intensity, film thickness, and surface roughness monitoring of LED, Laser, high power / high frequency device epi-structures, and many other applications based on compound semiconductors.

The RPMblue/FS is designed to provide fast, accurate, precise and reliable PL metrology across the entire wavelength range. This includes from high-Al content AlGaN alloys for GaN FET’s and UV lasers/LED’s to communication laser applications in the NIR and everything in between. To ensure the highest possible wavelength accuracy, the RPMblue/FS contains its own built-in spectral source for monochromator calibration.

• Wafer Sizes ≤ 200mm and sample pieces
• up to 80 wph @ 2 mm spatial resolution on 2” wafers
• Optional fully automated wafer handling with up to 3 cassette station
• Fast R-T stage for mapping or measurement at individual coordinates
• research grade 300mm focal length spectrometer
• large numerical aperture optics, for high photon collection efficiency and low intensity detection capability
• Up to 4 lasers (2 internal, 1 diode laser and 1 external) ranging from 213 nm – 1064 nm excitation wavelength
• Up to 3 gratings for high resolution spectral PL mapping
• Up to 2 detectors covering 200 nm to 2.6 μm
• Integrated white light source for thickness and reflectance measurements
• high speed non spectral mapping mode @ 2000 pps
• high speed spectral mapping mode @ 200 pps