NanoSpec 6500 Film Thickness

The NanoSpec 6500 utilizes an advanced spectroscopic reflectometer to measure optically transparent films that are used in the manufacture of thin film on glass for displays and other applications. Designed for maximum throughput, reliability and accuracy, the NanoSpec measures all transparent or translucent multi-stack films on virtually any kind of substrate. Capable of handling all sizes from “tablet” size glass to G10 panels almost three (3) meters square, the 6500 is specifically designed for a wide variety of production applications. The rugged system provides precise measurements of single-layer films such as oxide, nitride and photo-resist, as well as the top layer on film stacks of up to 3 layers in the thickness range of 100Å to 35µm and features an optional 0.75µm spot for small areas. Proprietary software enables Multilayer Film Analysis with the ability to select film constants, scan ranges and substrate types, the 6500 is the ideal tool for rapid process control measurements at the production level.

Product enhancements include the integration of ultra-violet (UV) spectroscopic reflectometry for the measurement of low temperature, deposited poly-silicon films and UV to near infra-red (NIR) as well as spectroscopic ellipsometry (SE) for the measurement of multilayer film stacks and improved measurement precision.

Data management features include a database, statistical analysis, histograms and the ability to and export data files. Both Tabular and Cauchy dispersion models are available for use and material files may be imported and exported.

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Standard Features

Comprehensive Measurements

The 6500 provides scanning from 400 to 800 nm and can measure single layer films such as oxide, nitride and photo-resist, as well as multiple layer film stacks when XMP software is utilized. Measurements can also be made on a wide variety of other substrates including silicon, aluminum and gallium arsenide.

Highly Configurable

The 6500 is highly configurable. Small spot size measurements can be performed with an optional 100x lens. With the 6500T model, film layers as thick as 70 µm are measurable with an installed small-aperture system. Consult the optional features list for a full listing of options available to the NanoSpec 6500.

Dynamic Software

The advanced software platform provides the process engineer with complete freedom and flexibility in creating custom measurement programs to meet the demanding needs of today's new micro-electronic Mass Production facilities. Data management features statistical analysis, histograms and the ability to import and export data files are all standard. Both tabular and Cauchy dispersion models are available for use and material files may be imported and exported.

Standard

• 6500 base unit includes 5x, 10x, 50x objectives

• XMP Film Analysis Software for Multi-layer instant measurements (Extended Material Package)

• Auto Focus capabilities

• Vibration Control

• UPS Backup system

• Windows based operating system

• Onboard 10/100 LAN

• 17” flat panel display

• Operations manual (CD)

Options & Accessories

• ESD Suppression Stage

• Advanced Particle Prevention system

• Automated Robotic L/UL

• Pattern Recognition

• Transmittance for Optical Density and Chromaticity

• FTIR for Hydrogen Content

• Sheet Resistivity Module (4PP)

• Signal Tower

• Ionizer

• Contact Angle Module

• Small aperture system for thick film measurement

• Small spot with 100x objective – 0.75 µm

• SECS, RS-232 or HSMS

• Color video camera with dedicated 17” flat panel display

• CIM Control

• HSMS or SECS interface

• CD-RW drive

• Clean-room operations manual (hard copy)

• NanoStandard film thickness standard wafer (6- or 8-inch)1

Notes:

1 NanoStandard® wafers are NIST·traceable film thickness standards consisting of six pads of different oxide thicknesses on silicon.

Utilized at all major Flat Panel Display fabs worldwide, the NanoSpec 6500 has been engineered to provide outstanding film thickness measurements. Widely respected as the leader among film analysis production systems, leading specifications and performance place the NanoSpec 6500 at the top of its class. Specifications are listed below.

NanoSpec 6500 Film Thickness Specification                           Flat Panel
   
Performance  
Film Stack / Number of Films  Up to 3 layers 
Wavelength Range  400 -800 nm 
Optional Transmittance Measurement 400 -800 nm 
   
Film Thickness Thickness Range1    
Standard Configuration (10x) 100 Å - 30 µm 
Range: single stack 10 nm ~ 35 µm1 
Repeatability 1.0% or 2 Å 2
Film Type  / n & k values obtained
Measurement Time  0.5 seconds per point (film dependant)
Data Management  Statistical data analysis, Data export (ASCII) 
Hardware Configuration   
Panel  Sizes  300 ~ 3200 mm 
Head Unit Interferometer / Reflectometer Linear Array
Optics / Spot Sizes   
5x (standard)  50 µm  
10 x (standard)  25 µm 
50x (standard)  5 µm 
100 x (optional for Thick film)  0.75 µm 
   
Optical Filters (Manual Cutoff Filters)   
Yellow cutoff filter  480 nm (measured at 50% light transmission) 
Orange cutoff filter  560 nm (measured at 50% light transmission) 
Light Source  Halogen
Computer  Intel Core2Duo/2.8 GHz or later
Facilities Requirements   
Dimensions  1700mm x 1700mm x 1830 
Weight  2200 Kg
Electrical  Single Phase AC 200V 50/60Hz, 10A
  230V, 50/60 Hz, 2.5 A 
Vacuum -55 to 80 KPa
   
   
  Notes:
  1 value obtained from SiO2/Si
  2 1 sigma based on measuring same site 15 times with 10X w/out autofocus after autofocus on first measurement.
  standard sample with interferance amplitude reflectance is greater than 5% of absolute reflectance
   
   

Theory: Reflectometry

The TohoSpec 6500 employs non-destructive, optical thin film measurement which analyzes the light-interference caused by thin layers. The reflection at the layer surface and layer-substrate interface results in constructive and destructive interference depending on the wavelength of the light.

As light strikes the surface of a film it is either transmitted or reflected at the upper surface. Light that is transmitted reaches the bottom surface and may once again be transmitted or reflected. The Fresnel equations provide a quantitative description of how much of the light will be transmitted or reflected at an interface. The light reflected from the upper and lower surfaces will interfere. The degree of constructive or destructive interference between the two light waves is dependent upon the difference in their phase. This difference is dependent upon the thickness of the film layer, the refractive index of the film, and the angle of incidence of the original wave on the film. Additionally, a phase shift of 180° or π radians may be introduced upon reflection at a boundary depending on the refractive indices of the materials on either side of the boundary. This phase shift occurs if the refractive index of the medium the light is travelling through is less than the refractive of the material it is striking. In other words, if n1 < n2 and the light is travelling from material 1 to material 2, then a phase shift will occur upon reflection. The pattern of light that results from this interference can appear either as light and dark bands or as colorful bands depending upon the source of the incident light. This basic theory is applied to the NanoSpec 6500.

As the layer thickness cannot be calculated out of these refection spectra directly, a special best-fit-algorithm is used to determine the layer thickness. In this way not only single layers but also multi-layer stacks with known optical data (n,k) can be measured easily and very fast.

The NanoSpec 6500 is most effective when these criteria are fully met.

1. A difference in the refractive index of the layers and the substrate must be present to get any reflection at the interface.

2. The layers must be transparent or semi-transparent in the spectral range in order to let the light through.

3. The substrate and the layer surface must be smooth enough (10 ~ 20nm) to obtain enough directly reflected light bounced back.

The TohoSpec 6500 is designed to provide accurate film thickness measurements within a vast array of Thin Film Measurement on Substrates of all sizes. With value added options like Contact Angle, Resistivity Heads, Pattern Recognition and XMP software, the TohoSpec 6500 provides multiple critical measurements on a single platform. Common Applications served by the TohoSpec 6500 include the following.

Displays: Oxides, Nitrides, Photo-Resist, Poly-Silicon

LCD: a-Si, n+ -aSi, Gate-SiNx, Oxides, PI, ITO, Cell Gap, Photoresist & Polyimide films

Optical Coating: Hard Coating, Anti-reflective coating, Filters

Dynamic Glass

Solar Thin Film

Other: CRT Photo-resist film, Shadow Masks, Thin metal films, Laser Mirrors

Films: All partially transparent films up to 100nm thick when using the XMP software application

Layers: Guaranteed 3 layer measurement and in some cases beyond 3 depending on parameters

Substrates: Most smooth or semi-smooth surfaces with some reflectance

Sample Info: Sequence of the film stack, film materials, nominal thickness of each layer

Common Film Configurations Measured by the NanoSpec 6500

SiOx / Glass, Metal SiOx / Poly-Si / SiOx / SiNx / Glass, Metal
SiNx / Glass, Metal Poly-Si / SiOx / SiNx / Glass, Metal
a-Si, n+a-Si / Glass, Metal a-Si / SiOx / SiNx / SiOx / Glass, Metal
ITO / Glass, Metal Resist / ITO / Glass
PI / Glass, Metal ITO / SiO2 / Glass
Resist / Glass, Metal PI / SiO2 / Glass
Ta2O5 / Glass SiOx / SiNx / Glass
Al2O3 / Al Ta2O5 / SiNx / Glass

6500

Substrate Size: 410 x 520 through 2160 x 2400
Measurement Head: SR: Reflectometer / Linear Array
Wavelength: 400 ~ 800 nm
Thickness Range: 10 nm to 35 µm
Multi-layer: with XMP up to 3 films simultaneously
Spot size options: 5x 50µm, 10x 25µm, 50x 5µm

6500 – SE

Core Applications: R&D, thinner than 100 Angstroms
Substrate Size: 730 x 920, 1500 x 1850, 1950 x 2250, 2160 x 2400 (flying head type only)
Measurement Head: SR: Reflectometer / Linear Array + SE: Elipsometer
Wavelength: SR: 400 ~ 800 nm
SE: 245 ~ 1000 nm
Thickness Range: SR: 10 nm to 35 µm
SE: 0nm ~ 2 µm
Multi-layer: up to 8 layers subject to sample structure
Spot size options: 5x 50µm, 10x 25µm, 50x 5µm
SE: 35 x 8 µm

6500 – UV

Substrate Size: 620 x 750 through 730 x 920
Measurement Head: SR: Reflectometer / Linear Array
Wavelength: 200 ~ 800 nm
Thickness Range: 4 nm to 35 µm
Multi-layer: with XMP up to 3 films simultaneously
Spot size options: 4x 50µm, 40x 6µm, 15x 18µm (UV)